Methods exist for the creation of antireflective thin film layers; however, many of these methods depend on the use of high temperatures, harsh chemical etches, or are made with difficult pattern materials, rendering them unusable for many applications. In addition, most methods of light blocking are specifically designed to increase light coupling and absorption in the substrate, making them incompatible with some appli-cations that also require blocking transmission of light. A method of forming a simple, patternable light-blocking layer that drastically reduces both transmission and reflection of light without dependence on processes that could damage underlying structures using a light scattering matte coating over a partially antireflective thin film light-blocking layer is presented.

中文翻译：

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使用液体哑光涂层的抗反射光阻隔层。

存在用于产生抗反射薄膜层的方法。但是，这些方法中的许多方法都取决于高温，苛刻的化学刻蚀的使用，或者是由困难的图形材料制成的，因此无法用于许多应用。此外，大多数遮光方法都是经过专门设计的，以增加基板中的光耦合和吸收，从而使其与某些也需要遮光的应用程序不兼容。提出了一种形成简单的，可图案化的光阻挡层的方法，该方法使用在部分抗反射薄膜光阻挡层上的光散射无光泽涂层，可以极大地降低光的透射和反射，而无需依赖于可能损坏下方结构的工艺。