Abstract. Background: Hybrid inorganic-organic materials have emerged as promising candidates for EUV resists. However, knowledge on their stability when deposited as thin films is essential for their performance in EUV lithography. Aim: We investigate whether the molecular structure of Zn-based metal oxoclusters is preserved upon thin film deposition and study aging processes of the thin film under different atmospheres, since these chemical changes affect the solubility properties of the material. Approach: A hybrid cluster that combines the high EUV photon absorption cross-sections of zinc and fluorine with the reactivity of methacrylate organic ligands was synthesized. The structural modifications upon thin film formation and after aging in air, nitrogen, and vacuum were studied using a combination of spectroscopic techniques. Preliminary studies on the lithographic performance of this material were performed by EUV interference lithography. Results: The Zn-based compound undergoes structural rearrangements upon thin film deposition as compared to the bulk material. The thin films degrade in air over 24 h, yet they are found to be stable for the duration and conditions of the lithography process and show high sensitivity. Conclusions: The easy dissociation of the ligands might facilitate hydrolysis and rearrangements after spin-coating, which could affect the reproducibility of EUV lithography.

中文翻译：

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基于锌金属氧簇的灵敏 EUV 光刻胶的稳定性研究

摘要。背景：混合无机-有机材料已成为 EUV 抗蚀剂的有希望的候选材料。然而，了解它们在沉积为薄膜时的稳定性对于它们在 EUV 光刻中的性能至关重要。目的：我们研究锌基金属氧簇的分子结构是否在薄膜沉积过程中得以保留，并研究薄膜在不同气氛下的老化过程，因为这些化学变化会影响材料的溶解性。方法：合成了一种混合簇，它结合了锌和氟的高 EUV 光子吸收截面和甲基丙烯酸酯有机配体的反应性。使用光谱技术的组合研究了薄膜形成和在空气、氮气和真空中老化后的结构变化。通过 EUV 干涉光刻对该材料的光刻性能进行了初步研究。结果：与块状材料相比，锌基化合物在薄膜沉积时会发生结构重排。薄膜在空气中降解超过 24 小时，但发现它们在光刻过程的持续时间和条件下是稳定的，并显示出高灵敏度。结论：配体的易解离可能会促进旋涂后的水解和重排，这可能会影响 EUV 光刻的重现性。然而，人们发现它们在光刻工艺的持续时间和条件下是稳定的，并显示出高灵敏度。结论：配体的易解离可能会促进旋涂后的水解和重排，这可能会影响 EUV 光刻的重现性。然而，人们发现它们在光刻工艺的持续时间和条件下是稳定的，并显示出高灵敏度。结论：配体的易解离可能会促进旋涂后的水解和重排，这可能会影响 EUV 光刻的重现性。