Electron beam lithography (EBL) on non-planar, suspended, curved or bent surfaces is still one of the most frequently stated problems for fabricating novel and innovative nano-devices and sensors for future technologies. Although spin coating is the most widespread technique for electron resist (e-resist) deposition on 2D or flat surfaces, it is inadequate for suspended and 3D architectures because of its lack of uniformity. In this work, we use a thermally evaporated electron sensitive resist the QSR-5 and study its sensitivity and contrast behaviour using EBL. We show the feasibility of utilizing the resist for patterning objects on non-planar, suspended structures via EBL and dry etching processes. We demonstrate the integration of metal or any kind of thin films at the apex of an atomic force microscopy (AFM) tip. This is showing the great potential of this technology in various fields, such as magnetism, electronic, photonics, phononics and other fields related to near field microscopy using AFM probe like for instance scanning thermal microscopy.

中文翻译：

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用于纳米级热探测的非平面、悬浮、3D AFM 悬臂梁上的电子束光刻

非平面、悬浮、弯曲或弯曲表面上的电子束光刻 (EBL) 仍然是为未来技术制造新颖和创新的纳米器件和传感器的最常见问题之一。尽管旋涂是在 2D 或平面上沉积电子抗蚀剂 (e-resist) 最广泛的技术，但由于缺乏均匀性，它不适用于悬浮和 3D 架构。在这项工作中，我们使用热蒸发电子敏感抗蚀剂 QSR-5 并使用 EBL 研究其灵敏度和对比度行为。我们展示了通过 EBL 和干法蚀刻工艺利用抗蚀剂在非平面、悬浮结构上图案化物体的可行性。我们展示了在原子力显微镜 (AFM) 尖端的顶点集成金属或任何类型的薄膜。