Abstract—

Autowave combustion of ferrosilicon aluminum with various metallic tantalum additives (5, 10, and 15 wt %) in nitrogen produces iron-containing ceramic-metal composites based on silicon nitride modified by the TaON semiconductor compound. The phase composition was determined by X-ray diffraction, and the surface morphology of the composites was studied by scanning electron microscopy (SEM). The surface iron composition was assessed using an attachment to a scanning electron microscope for X-ray microanalysis. The acid–base properties of the surface of the composites were studied by pH-metry and the Hammett–Tanabe indicator method with spectrophotometric indication. A comprehensive assessment of the acidity of the surface of the composites was performed, and the surface centers of the composites were identified. A wide range of acid–base sites (Lewis base centers, pK_a –0.29), acid sites (pK_a 1.3–6.5), and basic Brønsted sites (pK_a 7–13) were found, indicating the adsorption activity of the composites to various pollutants. We studied the adsorption of chloramphenicol (CHL) on these composites and proposed the adsorption mechanisms. A correlation was found between the adsorption activity of the composites to СHL (pK_a1 = 5.5; pK_a2 = 11.3) and their acidic properties. The photocatalytic activity of the composites during the oxidative degradation of CHL is studied. Iron-containing ceramic-metal composites based on TaON-modified silicon nitride are promising photocatalysts for the oxidative degradation of CHL (85–91%) under visible light irradiation with the addition of H₂O₂. Such a high activity is due to their adsorption properties and the combination of heterogeneous photocatalysis and a homogeneous photo-Fenton system.

中文翻译：

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含铁陶瓷金属复合材料可见光诱导氧化降解氯霉素

摘要-

硅铝铁与各种金属钽添加剂（5、10 和 15 wt%）在氮气中自动波燃烧可产生基于经 TaON 半导体化合物改性的氮化硅的含铁陶瓷金属复合材料。通过X射线衍射测定了相组成，并通过扫描电子显微镜（SEM）研究了复合材料的表面形貌。使用扫描电子显微镜附件进行 X 射线微量分析来评估表面铁成分。通过 pH 测定法和分光光度指示的 Hammett-Tanabe 指示剂法研究了复合材料表面的酸碱特性。对复合材料表面的酸度进行了综合评估，并确定了复合材料的表面中心。发现了K _a –0.29）、酸性位点（p K _a 1.3–6.5）和碱性布朗斯台德位点（p K _{a 7–13），表明复合材料对各种污染物的吸附活性。}我们研究了氯霉素（CHL）在这些复合材料上的吸附并提出了吸附机理。复合材料对 СHL 的吸附活性之间存在相关性（p K _a1 = 5.5；p K _a2= 11.3）及其酸性特性。研究了复合材料在CHL氧化降解过程中的光催化活性。基于 TaON 改性氮化硅的含铁陶瓷金属复合材料是一种很有前途的光催化剂，可在可见光照射下添加 H 2 O 2 氧化降解 CHL ( _85-91 % ₎。如此高的活性归因于它们的吸附特性以及非均相光催化和均相光芬顿系统的结合。