ABSTRACT

Pulsed vapour fluxes with proper controlled time duration were proved to be an important controlling dimension for the deposition of a desired thin film. In this work, deep oscillation magnetron sputtering was employed to tailor the ionized pulsed flux for Nb and Cr thin film grown on AISI 304 stainless steel. Through tuning the micropulse oscillating voltage-off time from 10 to 40 μs, Nb and Cr thin films showed an obvious variation on microstructure owing to the deposition flux transited from continuous to chopped ones. The deposited Nb thin films showed Nb(110) preferred orientation experienced a nanocrystallization process with compressive residual stress showing a slightly decrease. While Cr thin films showed Cr(110) preferred orientation without an obvious nancrystallization trend with its compressive stress turning to be tensile. The tailoring of the microstructure and properties relied on interval time between the two interrupted ionized deposition flux.

摘要

具有适当受控持续时间的脉冲蒸气通量被证明是沉积所需薄膜的重要控制维度。在这项工作中，采用深振荡磁控溅射来定制在 AISI 304 不锈钢上生长的 Nb 和 Cr 薄膜的电离脉冲通量。通过将微脉冲振荡电压关闭时间从10μs调整到40μs，由于沉积通量从连续流转变为断续流，Nb和Cr薄膜的微观结构表现出明显的变化。沉积的Nb薄膜显示Nb(110)择优取向经历了纳米晶化过程，残余压缩应力略有下降。而Cr薄膜表现出Cr(110)择优取向，没有明显的纳米化趋势，其压应力变为拉应力。