This paper describes the deposition of Nb doped vanadium dioxide (VO₂) films on a glass substrate by metal organic decomposition (MOD) and their thermochromic properties. The difference in thermochromic properties of VO₂ thin films on a glass substrate was investigated with and without a buffer layer of Hf0.5Zr0.5O2 (HZO). The phase transition temperature of VO₂ thin film successfully reduced from 83°C to 43°C on a glass substrate with a buffer layer of HZO. Without a buffer layer of HZO, the thermochromic properties of VO₂ thin films deteriorated comparing with a buffer layer of HZO. HZO buffer layer effectively suppresses the miniaturization of VO₂ crystallite size of thin film due to Nb doping. Moreover, it would block out the diffusion of Al, Na, and Ca impurity ions from a glass substrate and the partial oxidation of VO₂ thin films judging from XPS O1s spectra and XPS depth profile analysis. We conclude that the insertion of the HZO buffer layer is a useful technique for controlling the transition temperature of VO₂ for the smart window applications by MOD.

中文翻译：

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MOD 表征玻璃基板上生长的 VO2 薄膜

本文描述了通过金属有机分解（MOD）在玻璃基板上沉积铌掺杂二氧化钒（VO _{2 ）薄膜及其热致变色性能。研究了玻璃基板上有和没有Hf0.5Zr0.5O2 (HZO) 缓冲层的VO 2}薄膜热致变色性能的差异。在具有HZO缓冲层的玻璃基板上， VO ₂薄膜的相变温度成功地从83℃降低到43℃。没有HZO缓冲层时，与HZO缓冲层相比，VO ₂薄膜的热致变色性能恶化。_{HZO缓冲层有效抑制VO 2}的小型化由于 Nb 掺杂而导致的薄膜微晶尺寸。此外，从XPS O1s光谱和XPS深度剖面分析来看，它会阻止Al、Na和Ca杂质离子从玻璃基板的扩散以及VO ₂薄膜的部分氧化。我们得出结论，HZO 缓冲层的插入是通过 MOD 控制智能窗应用的VO ₂转变温度的有用技术。