We report sputtering yields of Li⁺, H⁻, O⁻, and OH_x⁻ ion species from an Li–O–H surface for H, D, He, Ne, and Ar ion irradiation at 45° incidence in the energy range of 30–2000 eV. A Li film was deposited on a stainless steel target using Li evaporators in the LTX-β vessel, using the LTX-β Sample Exposure Probe (SEP), which includes an ultrahigh vacuum suitcase for transferring targets without significant contamination from air exposure. The SEP was used to transfer the Li-coated target from LTX-β to a separate Sample Exposure Station (SES) to perform ion exposure measurements. The SEP was also used for characterization of the Li-coated target utilizing X-ray photoelectron spectroscopy in a different chamber, showing that the lithium film surface was oxidized. Ion exposures were performed using an electron cyclotron resonance plasma source in the SES. Sputtered/ejected species were sampled by a quadrupole mass spectrometer with capabilities for detecting positive and negative ions, and an energy filter for determining the mean kinetic energy of the ejected ion species. All ion irradiations caused Li⁺ ions to be ejected, while causing impurity ions such as H⁺, H⁻, O⁻ and OH⁻ to be ejected. Measured ion energies of Li⁺ ions from a Li–O–H surface suggested that the typical sheath potential on the divertor surface can trap sputtered Li⁺ ions, which were previously reported as ~ 60% of total sputtered Li species from Li targets (Allain and Ruzic in Nucl Fusion 42:202, 2002). Hence, our results for the sputtering yields of ejected ion species and their associated ion energies from a Li–O–H surface indicates that lithium sputtering is suppressed and impurity removal is enhanced due to the sheath potential at the divertor surface for fusion reactor applications.

^{我们报告了 Li +}、H ⁻、O ⁻和 OH _x ⁻的溅射产率来自 Li-O-H 表面的离子种类，用于 H、D、He、Ne 和 Ar 离子照射，以 45° 入射，能量范围为 30-2000 eV。使用 LTX-β 容器中的锂蒸发器，使用 LTX-β 样品暴露探针 (SEP) 将锂薄膜沉积在不锈钢靶材上，该探针包括一个超高真空手提箱，用于转移靶材，而不会因暴露在空气中而造成明显污染。SEP 用于将锂涂层靶材从 LTX-β 转移到单独的样品暴露站 (SES) 以执行离子暴露测量。SEP 还用于在不同的室中利用 X 射线光电子能谱对锂涂层靶进行表征，结果表明锂膜表面已被氧化。使用 SES 中的电子回旋共振等离子体源进行离子暴露。溅射/喷射物质通过具有检测正离子和负离子能力的四极质谱仪以及用于确定喷射离子物质的平均动能的能量过滤器进行采样。所有离子辐照均引起Li⁺离子被喷射，同时导致诸如H ⁺、H ^-、O ^-和OH ^-等杂质离子被喷射。测量的 Li-O-H 表面Li ⁺离子的离子能量表明，偏滤器表面上的典型鞘电位可以捕获溅射的 Li ⁺离子，此前报道称，这些离子占 Li 靶溅射 Li 物种总量的约 60%（Allain和 Ruzic 在 Nucl Fusion 42:202, 2002）。因此，我们对 Li-O-H 表面喷射离子种类的溅射产率及其相关离子能量的结果表明，由于聚变反应堆应用中偏滤器表面的鞘电位，锂溅射受到抑制，杂质去除得到增强。