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Modeling of Ca/P and deposit size responses of electrodeposited calcium-phosphate coating using full factorial design
Engineering Computations ( IF 1.6 ) Pub Date : 2023-11-02 , DOI: 10.1108/ec-02-2023-0087
Mohabbat Amirnejad , Mohammad Rajabi , Roohollah Jamaati

Purpose

This study aims to investigate the effect of electrodeposition parameters (i.e. time and voltage) on the properties of hydroxyapatite (HA) coating fabricated on Ti6Al4V surface.

Design/methodology/approach

A full factorial design along with response surface methodology was utilized to evaluate the main effect of independent variables and their relative interactions on response variables. The effect of electrodeposition voltage and deposition time on HA coatings Ca/P molar ratio and the size of deposited HA crystals were examined by structural equation modeling (SEM). The formation of plate-like and needle-like HA crystals was observed for all experiments.

Findings

The results obtained showed that the higher electrodeposition voltage leads to lower Ca/P values for HA coatings. This is more significant at lower deposition times, where at a 20-minute deposition time, the voltage increased from 2 to 3 V and the Ca/P decreased from 2.27 to 1.52. Full factorial design results showed that electrodeposition voltage has a more significant effect on the size of the deposited HA crystal. With increasing the voltage from 2 to 3 V at a deposition time of 20 min, the HA crystal size varied from 99 to 36 µm.

Originality/value

The investigation delved into the impact of two critical parameters, deposition time and voltage, within the electrodeposition process on two paramount properties of HA coatings. Analyzing the alterations in coating characteristics relative to variations in these process parameters can serve as a foundational guide for subsequent research in the domain of calcium-phosphate deposition for implants.



中文翻译:

使用全因子设计对电沉积磷酸钙涂层的 Ca/P 和沉积物尺寸响应进行建模

目的

本研究旨在研究电沉积参数(即时间和电压)对Ti6Al4V表面制备的羟基磷灰石(HA)涂层性能的影响。

设计/方法论/途径

采用全因子设计和响应面方法来评估自变量的主效应及其对响应变量的相对相互作用。通过结构方程模型 (SEM) 研究了电沉积电压和沉积时间对 HA 涂层 Ca/P 摩尔比和沉积 HA 晶体尺寸的影响。所有实验均观察到板状和针状 HA 晶体的形成。

发现

结果表明,较高的电沉积电压导致 HA 涂层的 Ca/P 值较低。这在较短的沉积时间下更为显着,在 20 分钟的沉积时间下,电压从 2V 增加到 3V,Ca/P 从 2.27 降低到 1.52。全因子设计结果表明,电沉积电压对沉积HA晶体的尺寸有更显着的影响。当沉积时间为 20 分钟时,电压从 2 V 增加到 3 V,HA 晶体尺寸从 99 µm 变化到 36 µm。

原创性/价值

该研究深入研究了电沉积过程中沉积时间和电压这两个关键参数对 HA 涂层两个重要性能的影响。分析涂层特性相对于这些工艺参数变化的变化可以作为植入物磷酸钙沉积领域后续研究的基础指南。

更新日期:2023-11-02
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