Advances in microfabrication technology have enabled electron beam lithography (EB lithography) systems to produce microfabrication on the order of 10 of nanometers. Using this technology, we have fabricated nanogap electrodes that can generate large electric fields at low voltages. The gap between the tips of the fabricated electrodes is 100 nm, and the curvature of each tip is 50 nm. The device was confirmed to work as an electronic vacuum gauge, the device successfully measured vacuum from 10⁻³ to 1 Pa at the electrode voltage of 3 V.

中文翻译：

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纳米间隙器件真空测量研究

微加工技术的进步使得电子束光刻（EB 光刻）系统能够进行 10 纳米量级的微加工。利用这项技术，我们制造了纳米间隙电极，可以在低电压下产生大电场。制作的电极尖端之间的间隙为100 nm，每个尖端的曲率为50 nm。该装置被证实可以作为电子真空计工作，在3 V的电极电压下，该装置成功测量了10 ^{-3至1 Pa的真空度。}