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Ultra-low reflection electromagnetic interference shielding nanofiber film with effective solar harvesting and self-cleaning
Journal of Leather Science and Engineering Pub Date : 2024-01-05 , DOI: 10.1186/s42825-023-00143-5
Bin Lyu , Yunchuan Wang , Dangge Gao , Shihao Guo , Yingying Zhou , Jianzhong Ma

It is urgent to develop low-reflection electromagnetic interference shielding material to shield electromagnetic waves (EMW) and reduce their secondary radiation pollution. Herein, an electromagnetic interference shielding nanofiber film is composed of ZnO and carbon nanofiber (CNF) via electrospinning and carbonization approachs, and subsequently coating perfuorooctyltriethoxysilane as a protective layer. On the one hand, ZnO coated by porous carbon, which is derived from ZIF-8, endows the nanofiber film low reflection property through optimizing impedance matching between free space and the nanofiber film. On the other hand, the nanofiber film possesses high electromagnetic interference shielding efficiency, which is beneficial by excellent electrical conductivity of CNF derived from waste leather scraps. Furthermore, the nanofiber film involves abundant interface, which contributes to high interfacial polarization loss. Thus, the nanofiber film with a thickness of 250 μm has electrical conductivity of 53 S/m and shielding efficiency of 50 dB. The reflection coefficient of the nanofiber film is inferior to 0.4 indicates that most of EMW are absorbed inside the materials and the nanofiber film is effective in reducing secondary radiation contamination of electromagnetic waves. Fortunately, the nanofiber film exhibits outstanding solar harvesting performance (106 ℃ at 1 sun density) and good self-cleaning performance, which ensure that the nanofiber film can work in harsh environments. This work supplies a credible reference for fabricating low-reflection electromagnetic shielding nanofiber film to reduce secondary radiation pollution and facilitates the upcycling of waste leather scraps.

中文翻译:

具有有效太阳能收集和自清洁功能的超低反射电磁干扰屏蔽纳米纤维膜

迫切需要开发低反射电磁干扰屏蔽材料来屏蔽电磁波(EMW)并减少其二次辐射污染。在此,电磁干扰屏蔽纳米纤维膜由ZnO和碳纳米纤维(CNF)通过静电纺丝和碳化方法组成,然后涂覆全氟辛基三乙氧基硅烷作为保护层。一方面,源自ZIF-8的多孔碳涂覆的ZnO通过优化自由空间与纳米纤维膜之间的阻抗匹配,赋予纳米纤维膜低反射性能。另一方面,纳米纤维膜具有较高的电磁干扰屏蔽效率,这得益于从废旧皮革废料中提取的CNF具有优异的导电性。此外,纳米纤维膜涉及丰富的界面,这导致界面偏振损耗较高。因此,厚度为250μm的纳米纤维膜的电导率为53S/m,屏蔽效率为50dB。纳米纤维膜的反射系数低于0.4,表明大部分电磁波被材料内部吸收,纳米纤维膜可有效减少电磁波的二次辐射污染。幸运的是,纳米纤维膜表现出出色的太阳能收集性能(1太阳密度下106℃)和良好的自清洁性能,这保证了纳米纤维膜可以在恶劣的环境下工作。该工作为制备低反射电磁屏蔽纳米纤维薄膜、减少二次辐射污染、促进废旧皮革边角料的升级利用提供了可靠的参考。
更新日期:2024-01-05
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