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Graphene/WGe2N4 van der Waals heterostructure: Controllable Schottky barrier by an electric field
Surface Science ( IF 1.9 ) Pub Date : 2024-01-13 , DOI: 10.1016/j.susc.2024.122450
XinQi Yuan , Hong Li , JunYan Lu , Kang An , Fengbin Liu , Jing Lu

The van der Waals (vdW) heterostructures exhibit excellent promise in nanoelectronics and optoelectronics. We present a novel vdW heterostructure made of graphene and a monolayer (ML) of WGe2N4 and use first-principles calculations to investigate how the Schottky barrier height (SBH) is impacted by an external electric field (Eext). Both component layers retain their fundamental electronic characteristics well due to the weak interfacial interaction. The graphene/WGe2N4 heterojunction is sensitive to Eext. The contact becomes an n-type and p-type ohmic contact at Eext = -0.3 V/Å and 0.6 V/Å, respectively. These findings suggest promising applications of the graphene/WGe2N4 vdW heterostructure in nanoelectronics.



中文翻译:

石墨烯/WGe2N4范德华异质结构:通过电场控制肖特基势垒

范德华(vdW)异质结构在纳米电子学和光电子学领域表现出良好的前景。我们提出了一种由石墨烯和 WGe 2 N 4单层 (ML) 制成的新型 vdW 异质结构,并使用第一原理计算来研究肖特基势垒高度 (SBH) 如何受到外部电场 (E ext ) 的影响。由于界面相互作用较弱,两个组件层都很好地保留了其基本电子特性。石墨烯/WGe 2 N 4异质结对E ext敏感。当E ext = -0.3 V/Å 和 0.6 V/Å 时,接触分别变为n型和p型欧姆接触 。这些发现表明石墨烯/WGe 2 N 4 vdW 异质结构在纳米电子学中的应用前景广阔。

更新日期:2024-01-13
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