The reliability of an Al-doped HfO${}_2$ dielectric used in a high density 2.5D MIMCAP is investigated by constant voltage stress (CVS) and voltage ramp stress (VRS) measurements. The good agreement of the results from the two techniques allows to propose a model for lifetime prediction based on the breakdown characteristics. The extracted activation energy shows a voltage dependence associated with a change in the degradation characteristics of the high-$\kappa$ material at high fields.

中文翻译：

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用于 2.5D MIMCAP 的先进掺铝 HfO2 电介质的基于电压斜坡应力的寿命预测模型

Al掺杂HfO的可靠性${}_2$通过恒压应力 (CVS) 和电压斜坡应力 (VRS) 测量研究高密度 2.5D MIMCAP 中使用的电介质。两种技术的结果非常一致，可以提出一种基于击穿特性的寿命预测模型。提取的活化能显示出与高退化特性的变化相关的电压依赖性。$\kappa$高场材料。