Injection of precursor molecules into a plasma often results in particle generation or deposition in the source, compromising film quality and plasma operation. We present here a study of ion chemistry and ionic film deposition from hexamethyldisilane (HMDS) using a novel device utilizing vacuum ultraviolet (VUV)-radiation from a remote atmospheric plasma. Infrared spectroscopy showed that -like films were obtained at the lowest admixture, where impurities are more important and VUV-photons reach the substrate, while only slightly oxidized films were deposited at high admixtures. Photoionization mainly forms the monomer ion due to collisional stabilization and possibly slow polymerization reactions as found by ion mass spectrometry. The more detailed photochemistry of HMDS-related ions is discussed based on mass spectra for different admixtures.

中文翻译：

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大气等离子体 VUV 辐射诱导的 HMDS 光化学的离子化学和离子薄膜沉积

将前体分子注入等离子体通常会导致粒子在源中产生或沉积，从而影响薄膜质量和等离子体操作。我们在此提出了一项利用远程大气等离子体真空紫外 (VUV) 辐射的新型装置对六甲基乙硅烷 (HMDS) 进行离子化学和离子薄膜沉积的研究。红外光谱表明在最低的混合物中获得类薄膜，其中杂质更重要并且VUV光子到达基底，而在高的混合物中仅沉积轻微氧化的薄膜。离子质谱法发现，由于碰撞稳定和可能缓慢的聚合反应，光电离主要形成单体离子。基于不同混合物的质谱讨论了 HMDS 相关离子的更详细的光化学。