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Halogen Bonds in the Structure of Tetrabromophenylbutane
Journal of Structural Chemistry ( IF 0.8 ) Pub Date : 2024-02-09 , DOI: 10.1134/s0022476624010074
G. G. Korablev , P. V. Dorovatovskii , A. N. Efremov , A. A. Osipov , K. Rajakumar , S. A. Nayfert , D. A. Zherebtsov

Abstract

The crystal structure of 1,2,3,4-tetrabromo,1-phenylbutane determined by single crystal synchrotron X-ray diffraction is described. Molecules of the compound compose a layered structure of the Langmuir–Blodgett film type (with tail-to-tail, head-to-head orientations of molecules of the neighboring layers) in which phenyl radicals of one layer contact with those of another. Halogen bonds and Br⋯Br contacts (four per each molecule) have the key importance for the molecular packing in the layer. The distance between bromine atoms in these bonds and contacts is 3.656-4.002 Å. The thermal analysis shows that the tetrabromophenylbutane melting point is 148 °C, with the compound starting to decompose at 150-280 °C in one step with releasing HBr and benzene.

更新日期:2024-02-09
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