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Investigation on the Mist Intensity to Deposit Gallium Oxide Thin Films by Mist Chemical Vapor Deposition
Physica Status Solidi-Rapid Research Letters ( IF 2.8 ) Pub Date : 2024-02-12 , DOI: 10.1002/pssr.202470003 Swapnodoot Ganguly 1 , Krishna Nama Manjunatha 1 , Shashi Paul 1
Physica Status Solidi-Rapid Research Letters ( IF 2.8 ) Pub Date : 2024-02-12 , DOI: 10.1002/pssr.202470003 Swapnodoot Ganguly 1 , Krishna Nama Manjunatha 1 , Shashi Paul 1
Affiliation
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Mist Chemical Vapor Deposition
中文翻译：
雾化化学气相沉积氧化镓薄膜的雾化强度研究
雾气化学气相沉积
更新日期：2024-02-12
中文翻译：
雾化化学气相沉积氧化镓薄膜的雾化强度研究
雾气化学气相沉积
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