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Superconducting nitridized-aluminum thin films
Superconductor Science and Technology ( IF 3.6 ) Pub Date : 2024-02-14 , DOI: 10.1088/1361-6668/ad20fc
Alba Torras-Coloma , Leyre Martínez de Olcoz , Eva Céspedes , Elia Bertoldo , David López-Núñez , Sagar Paul , Wolfgang Wernsdorfer , Gemma Rius , P Forn-Díaz

We report the direct observation of superconductivity in nitridized-aluminum thin films. The films are produced by sputtering deposition of aluminum in a controlled mixture of nitrogen diluted in argon. The concentration of applied nitrogen directly determines the properties of the superconducting thin films. We observe samples displaying critical temperatures up to 3.38 ± 0.01 K and resilience to in-plane magnetic fields well above 1 T, with good reproducibility of the results. This work represents an unambiguous demonstration of tunable superconductivity in aluminum-based nitridized thin films. Our results put forward nitridized aluminum as a promising material to be employed in superconducting quantum circuits for quantum technology applications.

中文翻译:

超导氮化铝薄膜

我们报告了氮化铝薄膜中超导性的直接观察。这些薄膜是通过在氩气中稀释的受控氮气混合物中溅射沉积铝来生产的。施加的氮气浓度直接决定超导薄膜的性能。我们观察到样品显示出高达 3.38 ± 0.01 K 的临界温度和远高于 1 T 的面内磁场弹性,结果具有良好的可重复性。这项工作明确证明了铝基氮化薄膜中的可调谐超导性。我们的研究结果表明氮化铝是一种有前途的材料,可用于量子技术应用的超导量子电路。
更新日期:2024-02-14
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