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Preparation of Ti/Sn-SbOx/β-PbO2-Ta2O5 composite anode by pulsed electrodeposition and its electrochemical properties
Solid State Ionics ( IF 3.2 ) Pub Date : 2024-03-07 , DOI: 10.1016/j.ssi.2024.116477
Junjie Guo , Cheng Jiang , Chao Gao , Buming Chen , Hui Huang , Yapeng He , Zhongcheng Guo , Jun Guo , Ruidong Xu

In this paper, Ti/Sn-SbOx/β-PbO-TaO composite electrodes were prepared by pulsed electrodeposition, the doping amount and the mechanism of TaO embed into the gap between PbO particles was analysized. The effect of TaO doping on microstructure and cyrstal structure and electrochemical performance of electrodes were was characterized by scanning electron microscopy (SEM), X-ray diffractometry (XRD), X-ray photoelectron spectroscopy (XPS), and Inductively Coupled Plasma (ICP). The surface of the electrode became flatter and denser with appropriate amount of TaO doping, leading to the improvement of the electrocatalytic activity of the electrode. The effect of TaO doping on the electrochemical performances of the electrodes were analyzed by linear scanning voltammetry (LSV), cyclic voltammetry (CV), and electrochemical impedance spectroscopy (EIS). The service life and failure mechanism of Ti/Sn-SbOx/β-PbO-TaO composite electrodes were investigated by accelerated life corrosion test and SEM. Finally, the possibilities possibility application of the Ti/Sn-SbOx/β-PbO-TaO composite electrodes in the area of copper electrowinning test was investigated.

中文翻译:

脉冲电沉积制备Ti/Sn-SbOx/β-PbO2-Ta2O5复合阳极及其电化学性能

本文采用脉冲电沉积法制备了Ti/Sn-SbOx/β-PbO-TaO复合电极,并分析了TaO的掺杂量以及TaO嵌入PbO颗粒间隙的机理。通过扫描电子显微镜(SEM)、X射线衍射(XRD)、X射线光电子能谱(XPS)和电感耦合等离子体(ICP)表征TaO掺杂对电极微观结构、晶体结构和电化学性能的影响。适量TaO掺杂使电极表面变得更加平坦和致密,从而提高了电极的电催化活性。通过线性扫描伏安法(LSV)、循环伏安法(CV)和电化学阻抗谱(EIS)分析TaO掺杂对电极电化学性能的影响。通过加速寿命腐蚀试验和扫描电镜研究了Ti/Sn-SbOx/β-PbO-TaO复合电极的使用寿命和失效机理。最后,探讨了Ti/Sn-SbOx/β-PbO-TaO复合电极在铜电解提取领域的应用可能性。
更新日期:2024-03-07
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