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High-responsivity van der Waals Schottky photodiodes based on maskless etched wafer-scale silicon nanoholes
IEEE Electron Device Letters ( IF 4.9 ) Pub Date : 2024-03-14 , DOI: 10.1109/led.2024.3376001 Zhaohui Yang 1 , Gaobin Xu 1 , Shirong Chen 1 , Yongqiang Yu 1 , Baichuan Sun 1 , Cunhe Guan 1 , Jianguo Feng 1 , Yuanming Ma 1 , Xing Chen 1
中文翻译：
基于无掩模蚀刻晶圆级硅纳米孔的高响应度范德华肖特基光电二极管
更新日期：2024-03-14
IEEE Electron Device Letters ( IF 4.9 ) Pub Date : 2024-03-14 , DOI: 10.1109/led.2024.3376001 Zhaohui Yang 1 , Gaobin Xu 1 , Shirong Chen 1 , Yongqiang Yu 1 , Baichuan Sun 1 , Cunhe Guan 1 , Jianguo Feng 1 , Yuanming Ma 1 , Xing Chen 1
Affiliation
中文翻译：
基于无掩模蚀刻晶圆级硅纳米孔的高响应度范德华肖特基光电二极管
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