The nickel oxide (NiO) film is often employed as a hole transport layer for the production of high-performance inverted perovskite solar cells due to its exceptional chemical stability, high hole mobility, and matching energy level structure. Among various techniques for preparing NiO, E-beam evaporation-based NiO films show great promise owing to their low fabrication temperature and excellent photoelectric properties. Herein, an ion bombardment source was used to generate oxygen plasma through the bombardment of oxygen molecules, which subsequently oxidized the non-stoichiometric NiO. Experimental findings demonstrate that this method substantially enhances the electrical and optical properties of the NiO film. We utilized a room-temperature-processed NiO film as a hole transport layer to fabricate inverted wide-bandgap perovskite solar cells, resulting in a champion device efficiency of 17.82%. It is anticipated that the NiO films produced via this approach will be widely adopted in the industrialization of perovskite solar cells.

中文翻译：

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用于宽带隙钙钛矿太阳能电池的室温处理等离子体激活氧化镍薄膜

氧化镍（NiO）薄膜由于其优异的化学稳定性、高空穴迁移率和匹配的能级结构，通常用作空穴传输层，用于生产高性能倒置钙钛矿太阳能电池。在各种制备NiO的技术中，基于电子束蒸发的NiO薄膜由于其较低的制造温度和优异的光电性能而显示出巨大的前景。在此，使用离子轰击源通过氧分子的轰击产生氧等离子体，随后氧化非化学计量的NiO。实验结果表明，该方法显着增强了 NiO 薄膜的电学和光学性能。我们利用室温处理的 NiO 薄膜作为空穴传输层来制造倒置宽带隙钙钛矿太阳能电池，获得了 17.82% 的冠军器件效率。预计通过这种方法生产的NiO薄膜将在钙钛矿太阳能电池的产业化中得到广泛采用。