Abstract

Pulsed EMF in resistive thick-film Ag–Pd elements is experimentally studied when their surface is irradiated with a laser beam. The dependences of the pulsed EMF on the coordinate of the action of the laser beam on the film surface are obtained. It is shown that applying a constant bias voltage to a thick-film resistive element can significantly increase the amplitude of unipolar EMF pulses induced by laser pulses. It was found that the amplitude and frequency of the EMF signals depend, respectively, on the power and frequency of laser pulses. It is shown that by the value of the pulsed EMF it is possible to control the parameters of the high-power laser radiation incident on the surface in real time. The design of a receiver for recording the parameters of laser radiation based on an Ag–Pd sensitive element has been developed. The sensitivity of the device for measuring the power and pulse repetition rate is estimated.

中文翻译：

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激光脉冲引起的 Ag-Pd 电阻器的脉冲电导率

摘要

当电阻厚膜 Ag-Pd 元件表面受到激光束照射时，其脉冲电动势经过实验研究。获得了脉冲电动势对激光束作用在薄膜表面上的坐标的依赖性。结果表明，向厚膜电阻元件施加恒定的偏置电压可以显着增加激光脉冲引起的单极电动势脉冲的幅度。研究发现，EMF 信号的幅度和频率分别取决于激光脉冲的功率和频率。结果表明，通过脉冲电动势的值可以实时控制入射到表面的高功率激光辐射的参数。基于银钯敏感元件的用于记录激光辐射参数的接收器的设计已经开发出来。估计用于测量功率和脉冲重复率的装置的灵敏度。