当前位置：
X-MOL 学术
›
IEEE Electron Device Lett.
›
论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
The Enhanced Polarization Switching Speed and Endurance in Hf0.5Zr0.5O2 Ferroelectric Thin Film by Modulating Oxygen Dose in Ferroelectric Layers
IEEE Electron Device Letters ( IF 4.9 ) Pub Date : 2024-03-20 , DOI: 10.1109/led.2024.3379499 Yu-Chun Li 1 , Xiao-Xi Li 2 , Zi-Ying Huang 1 , Xiao-Na Zhu 1 , David Wei Zhang 1 , Hong-Liang Lu 1
中文翻译：
通过调节铁电层中的氧剂量提高 Hf0.5Zr0.5O2 铁电薄膜的偏振切换速度和耐久性
更新日期：2024-03-20
IEEE Electron Device Letters ( IF 4.9 ) Pub Date : 2024-03-20 , DOI: 10.1109/led.2024.3379499 Yu-Chun Li 1 , Xiao-Xi Li 2 , Zi-Ying Huang 1 , Xiao-Na Zhu 1 , David Wei Zhang 1 , Hong-Liang Lu 1
Affiliation
中文翻译：
通过调节铁电层中的氧剂量提高 Hf0.5Zr0.5O2 铁电薄膜的偏振切换速度和耐久性
京公网安备 11010802027423号