Electron microscopy, an important technique that allows for the precise determination of structural information with high spatiotemporal resolution, has become indispensable in unravelling the complex relationships between material structure and properties ranging from mesoscale morphology to atomic arrangement. However, beam-sensitive materials, particularly those comprising organic components such as metal–organic frameworks (MOFs) and covalent organic frameworks (COFs), would suffer catastrophic damage from the high energy electrons, hindering the determination of atomic structures. A low-dose approach has arisen as a possible solution to this problem based on the integration of advancements in several aspects: electron optical system, detector, image processing, and specimen preservation. This article summarizes the transmission electron microscopy characterization of MOFs and COFs, including local structures, host–guest interactions, and interfaces at the atomic level. Revolutions in advanced direct electron detectors, algorithms in image acquisition and processing, and emerging methodology for high quality low-dose imaging are also reviewed. Finally, perspectives on the future development of electron microscopy methodology with the support of computer science are presented.

中文翻译：

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通过低剂量电子显微镜对光束敏感的 COF 和 MOF 进行原子级成像

电子显微镜是一种能够以高时空分辨率精确确定结构信息的重要技术，在揭示从介观形态到原子排列的材料结构和性质之间的复杂关系方面已成为不可或缺的。然而，光束敏感材料，特别是那些包含有机成分（如金属有机骨架（MOF）和共价有机骨架（COF））的材料，会遭受高能电子的灾难性损坏，阻碍原子结构的确定。基于电子光学系统、探测器、图像处理和标本保存等多个方面的进步，低剂量方法成为解决该问题的可能解决方案。本文总结了 MOF 和 COF 的透射电子显微镜表征，包括局部结构、主客体相互作用和原子水平的界面。还回顾了先进直接电子探测器的革命、图像采集和处理算法以及高质量低剂量成像的新兴方法。最后，对计算机科学支持下的电子显微镜方法的未来发展进行了展望。