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Investigation of Prepulse of SiC Drift Step Recovery Diode in Fast Interruption Process
IEEE Transactions on Electron Devices ( IF 3.1 ) Pub Date : 2024-03-28 , DOI: 10.1109/ted.2024.3379959 Xiaoxue Yan 1 , Lin Liang 1 , Zewei Yang 1 , Hai Shang 1
IEEE Transactions on Electron Devices ( IF 3.1 ) Pub Date : 2024-03-28 , DOI: 10.1109/ted.2024.3379959 Xiaoxue Yan 1 , Lin Liang 1 , Zewei Yang 1 , Hai Shang 1
Affiliation
The output pulse voltage with a front of high dV/dt is an important feature in the application of silicon carbide (SiC) drift step recovery diodes (DSRDs). However, the presence of prepulse leads to a deformation of the pulse front, reducing its mean rising rate. The influence factors and mechanisms of prepulse of 4H-SiC DSRD are investigated in this article. $\eta $ is proposed to evaluate the prepulse characteristics, which is defined as the ratio of the prepulse amplitude (
${V}_{\text {pre}}{)}$ to the peak output voltage (
${V}_{\text {peak}}{)}$
. A good output characteristic should have a low $\eta $
. The experimental results indicate that the device area (
${S}{)}$
, power supply voltage (
${V}_{\text {cc}}{)}$
, and load resistance (
${R}_{\text {load}}{)}$ have a significant impact on the prepulse. Through Sentaurus TCAD simulation, the effects of the three factors on prepulse were further obtained over a larger range of variations. The simulation results agree with the experimental data well. The results indicate that ${V}_{\text {pre}}$ does not depend on ${V}_{\text {peak}}$
. Increasing ${S}$
, ${R}_{\text {load}}$
, and ${V}_{\text {cc}}$ can all reduce $\eta $
, but only an increase in ${S}$ can reduce ${V}_{\text {pre}}$ among the three factors. From the perspective of prepulse characteristics, SiC DSRDs are more suitable for application at higher voltage conditions rather than lower voltage, as there is often a lower $\eta $ under higher voltage conditions.
中文翻译:
快速中断过程中SiC漂移阶跃恢复二极管预脉冲的研究
具有高 dV/dt 前沿的输出脉冲电压是碳化硅 (SiC) 漂移阶跃恢复二极管 (DSRD) 应用中的重要特征。然而,预脉冲的存在会导致脉冲前沿变形,降低其平均上升率。本文研究了4H-SiC DSRD预脉冲的影响因素和机制。 $\eta$ 提出了评估预脉冲特性的方法,其定义为预脉冲幅度的比率(
${V}_{\text {前}}{)}$ 到峰值输出电压(
${V}_{\text {峰值}}{)}$
。良好的输出特性应具有低 $\eta$
。实验结果表明,器件面积(
${S}{)}$
,电源电压(
${V}_{\text {cc}}{)}$
,和负载电阻(
${R}_{\text {加载}}{)}$ 对前脉冲有显着影响。通过Sentaurus TCAD仿真,在更大的变化范围内进一步获得了这三个因素对预脉冲的影响。模拟结果与实验数据吻合良好。结果表明 ${V}_{\text {pre}}$ 不依赖于 ${V}_{\text {峰值}}$
。增加 ${S}$
, ${R}_{\text {加载}}$
, 和 ${V}_{\text {cc}}$ 都可以减少 $\eta$
,但只增加了 ${S}$ 可以减少 ${V}_{\text {pre}}$ 三个因素之中。从预脉冲特性的角度来看,SiC DSRD 更适合在较高电压条件下应用而不是在较低电压条件下应用,因为通常存在较低的电压条件。 $\eta$ 在较高电压条件下。
更新日期:2024-03-28
中文翻译:
快速中断过程中SiC漂移阶跃恢复二极管预脉冲的研究
具有高 dV/dt 前沿的输出脉冲电压是碳化硅 (SiC) 漂移阶跃恢复二极管 (DSRD) 应用中的重要特征。然而,预脉冲的存在会导致脉冲前沿变形,降低其平均上升率。本文研究了4H-SiC DSRD预脉冲的影响因素和机制。