In this letter, we investigated the ferroelectric characteristics of Hf0.5Zr0.5O2 (HZO) deposited by radio frequency (RF) sputtering at various deposition powers and the impact of additional long-term furnace annealing (FA) after ferroelectric formation annealing. Significant improvements in the ferroelectric properties were clearly observed by reducing the deposition power and implementing FA. Based on the analysis of the distribution of oxygen defects in HZO, it was found that the enhanced ferroelectric properties due to lower deposition power and additional FA resulted from the reduction of oxygen defects, which prevented polarization switching by pinning the domains. Moreover, the ferroelectric characteristics were further improved by the transition from the nonferroelectric phase to the ferroelectric phase by FA. Material design guidelines for sputtered HZO are provided through the modulation of deposition power and thermal treatment.

中文翻译：

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沉积功率和热处理对溅射Hf₀.₅Zr₀.₅O2铁电性能的影响

在这封信中，我们研究了在不同沉积功率下通过射频（RF）溅射沉积的Hf0.5Zr0.5O2（HZO）的铁电特性以及铁电形成退火后额外的长期炉内退火（FA）的影响。通过降低沉积功率和实施 FA，可以清楚地观察到铁电性能的显着改善。通过对 HZO 中氧缺陷分布的分析，发现较低的沉积功率和额外的 FA 导致铁电性能增强，这是由于氧缺陷的减少，通过钉扎磁畴来防止极化切换。此外，通过FA从非铁电相向铁电相的转变进一步改善了铁电特性。通过调节沉积功率和热处理来提供溅射 HZO 的材料设计指南。