Ni/Ti multilayers have been therefore widely used in neutron optics devices because of their excellent reflective properties for neutrons, which is strongly dependent to their interfaces and microstructure. Hence, there have been many attempts to improve the interfaces and microstructure of Ni/Ti multilayers, for example reactive sputtering, interlayers and so on. In this paper, the influence of energy of Ar recoil particles on the interface and micro-structure of Ni/Ti multilayers were completed, through varying the sputtering pressure. Firstly, the Simulation present that the decreasing of sputtering pressure would enlarge the number recoil particle proportion. Secondly, three Ni/Ti multilayers were fabricated by direct current sputtering technique with variable sputtering pressures (0.080Pa, 0.120Pa, 0.199Pa). Thirdly, the grazing incidence X-ray reflectometry (GIXRR), diffusing scattering, X-Ray Diffraction (XRD), Transmission Electron Microscope (TEM) were used to characterize the interfaces and micro-structure of these films. The measured results present that their interfacial width and roughness were variable as diseasing the sputtering pressure, and the micro-structure of Ni layers transform from (111) only to both (111) and (100). These experimental results could result from the effects of energy of both Ar recoil particles and the Ni, Ti depositing atoms.

中文翻译：

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Ar反冲粒子能量对直流磁控溅射Ni/Ti多层膜界面及微观结构的影响

因此，镍/钛多层膜因其优异的中子反射性能而被广泛应用于中子光学器件，而这在很大程度上取决于它们的界面和微观结构。因此，人们进行了许多尝试来改善Ni/Ti多层膜的界面和微观结构，例如反应溅射、中间层等。本文通过改变溅射压力，完成了Ar反冲粒子能量对Ni/Ti多层膜界面和微观结构的影响。首先，模拟结果表明，溅射压力的降低会导致反冲粒子数比例增大。其次，采用直流溅射技术，在不同的溅射压力（0.080Pa、0.120Pa、0.199Pa）下制备了三个Ni/Ti多层膜。第三，利用掠入射X射线反射仪（GIXRR）、漫散射、X射线衍射（XRD）、透射电子显微镜（TEM）对这些薄膜的界面和微观结构进行了表征。测量结果表明，它们的界面宽度和粗糙度随着溅射压力的变化而变化，并且Ni层的微观结构从仅(111)转变为(111)和(100)。这些实验结果可能是由于Ar反冲粒子和Ni、Ti沉积原子能量的影响而产生的。