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Oxidation resistant high permeance PVBTMAC/PSS layer-by-layer self-assembled nanofiltration membrane
Desalination ( IF 9.9 ) Pub Date : 2024-04-03 , DOI: 10.1016/j.desal.2024.117602
Bowen Zhou , Juan Luo , Ruitao Li , Rongrong He , Tao He

Oxidation resistant nanofiltration (NF) membranes have been pursued for wide applications. Mostly researched NF membranes were based on interfacial polymerization (IP) technology, which is not stable in oxidative chemicals. In this paper, a novel layer-by-layer (LBL) self-assembled NF membrane prepared by coating poly(vinylbenzyltrimethylammonium chloride)/poly(styrene sulfonic) (PVBTMAC/PSS) on a polyethersulfone (PES) substrate was presented with exceptionally high permeance and oxidation resistance. The optimized NF membrane of [PVBTMAC/PSS] demonstrated a pure water permeance (PWP) of 47.6 L/(m·h·bar) and nearly 100% rejection for various dyes. The PVBTMAC/PSS membrane showed distinct rejection to asymmetric salts (MgCl, NaSO) following Donnan exclusion. Excellent chlorine resistance was found after 150,000 ppm·h sodium hypochlorite treatment for both [PVBTMAC/PSS] and [PVBTMAC/PSS], demonstrated by the stable rejection to MgSO and prussian blue (PB) dye with reduced pore size. Declined rejection to MgCl and increased rejection to NaSO was explained by oxidation of the highly active α-H on the aromatic ring side group of PVBTMAC to -COO and Donnan exclusion effect. The integrity of LBL NF membranes was caused by additional π-π stacking between the polyelectrolytes. Both membranes demonstrated good long-term operational stability for dye separation with great potential for real applications.

中文翻译:

抗氧化高渗透PVBTMAC/PSS逐层自组装纳滤膜

抗氧化纳滤(NF)膜已得到广泛应用。大多数研究的纳滤膜都是基于界面聚合(IP)技术,该技术在氧化化学品中不稳定。本文提出了一种新型层层(LBL)自组装纳滤膜,该膜通过在聚醚砜(PES)基底上涂覆聚(乙烯基苄基三甲基氯化铵)/聚(苯乙烯磺酸)(PVBTMAC/PSS)而制备。渗透性和抗氧化性。优化的[PVBTMAC/PSS]纳滤膜的纯水渗透性(PWP)为47.6 L/(m·h·bar),对各种染料的截留率接近100%。在 Donnan 排除后,PVBTMAC/PSS 膜对不对称盐(MgCl、NaSO)表现出明显的排斥作用。经过 150,000 ppm·h 次氯酸钠处理后,[PVBTMAC/PSS] 和 [PVBTMAC/PSS] 均具有优异的耐氯性,这通过对 MgSO 和普鲁士蓝 (PB) 染料的稳定截留以及孔径减小来证明。对 MgCl 的截留率下降,对 Na2SO4 的截留率增加,这可以通过 PVBTMAC 芳环侧基上的高活性 α-H 氧化为 -COO 和 Donnan 排斥效应来解释。 LBL NF 膜的完整性是由聚电解质之间额外的 π-π 堆积引起的。这两种膜在染料分离方面都表现出良好的长期运行稳定性,具有巨大的实际应用潜力。
更新日期:2024-04-03
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