Accelerated electrons up to 5 MeV energy are relatively low-penetrating, and in the second half of the penetration length, the non-uniformity of energy deposition can increase by 20–50% per 1 mm of material depth. This feature of 1–5 MeV electrons, widely used in technology and research, as well as the high cost of beam power, requires the researcher to have the skills to identify areas of optimal energy deposition and develop measures to reduce energy loss. This work examines the dependence of the average absorbed dose and dose non-uniformity for three modes of electron beam treatment of water, taking into account the beam direction (horizontal or vertical, 1–5 MeV), beam window foil thickness (20–100 μm Al or Ti) and glass wall thickness (0.2–2 mm Pyrex). The dependencies are applicable to clarify, predict and analyze the dose distribution in a liquid irradiated in a tube, jet or tray.

中文翻译：

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用 1-5 MeV 电子处理的充水管、喷射器和托盘中的剂量分布曲线比较

高达5 MeV能量的加速电子穿透力相对较低，在穿透长度的后半段，每1毫米材料深度，能量沉积的不均匀性可增加20%~50%。 1-5 MeV 电子的这一特点广泛应用于技术和研究，以及束流功率的高成本，要求研究人员具备识别最佳能量沉积区域并制定减少能量损失的措施的技能。这项工作研究了三种电子束水处理模式的平均吸收剂量和剂量不均匀性的依赖性，考虑到电子束方向（水平或垂直，1-5 MeV）、电子束窗口箔厚度（20-100 μm Al 或 Ti）和玻璃壁厚度（0.2–2 mm Pyrex）。这些相关性适用于澄清、预测和分析管、喷射器或托盘中辐照液体的剂量分布。