Abstract
The attributes of memristors such as their non-volatile nature, simple structure, no leakage current, and fast switching speed present enormous opportunities for various analog and digital applications. It is imperative to develop an accurate physical model of the memristor in order to design digital applications. Hitherto published memristor modeling approaches do not match the practical memristor dynamics. In this work, a new model is developed by considering Schottky contact at the metal–insulator–metal (MIM) interfaces, and a novel memristor is fabricated to validate the proposed model. A bead polymer based on methyl methacrylate and n-butyl methacrylate (MMBM) is first used to explore the resistive switching properties of the device. A cost-effective screen printing technique is demonstrated to deposit the resistive switching layer for the fabrication of the memristor. The resistive switching behavior is observed in the sandwiched layer with a silver (Ag) top electrode and copper (Cu) bottom electrode. The surface morphology and electrical characteristics of the fabricated device are investigated by scanning electron microscopy and two-point probe resistivity measurement. The results confirm the formation of the Schottky barriers at the MIM interfaces of the fabricated device. The proposed model is compared with the device described in this paper having an error of 0.7609 (in terms of the relative root-mean-square error). Moreover, a NOR logic gate is simulated for the circuit simulation of the proposed model. This will pave the way for new digital design applications based on the memristor.
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Zafar, M., Awais, M.N., Shehzad, M.N. et al. Phenomenological modeling of memristor fabricated by screen printing based on the structure of Ag/polymer/Cu. J Comput Electron 22, 1735–1747 (2023). https://doi.org/10.1007/s10825-023-02104-x
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DOI: https://doi.org/10.1007/s10825-023-02104-x