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Effective Methods of Synthesis and Optimization of a Holographic Mask

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Abstract

Several statements of the problems of synthesis of a holographic mask in the form of optimization problems for quality of holographic images are presented. An effective algorithm for the synthesis of holographic masks based on FFT with the complexity O(NlnN), where N is the number of elements of the depicted object, is described. Based on this algorithm, a scalable software package has been developed and implemented that allows synthesizing holographic masks for various lithography applications, including the production of MEMS, MOEMS, and high-end chips. Experimental results are presented.

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This work was supported by ongoing institutional funding. No additional grants to carry out or direct this particular research were obtained.

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  1. Ishlinskii Institute for Problems in Mechanics, Russian Academy of Sciences, Moscow, Russia

    V. V. Chernik

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  1. V. V. Chernik
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Correspondence to V. V. Chernik.

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Chernik, V.V. Effective Methods of Synthesis and Optimization of a Holographic Mask. Dokl. Phys. 68, 328–333 (2023). https://doi.org/10.1134/S1028335823100038

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