• Letter

Onset of uncontrolled polytypism during the Au-catalyzed growth of wurtzite GaAs nanowires

Wouter H. J. Peeters, Marco Vettori, Elham M. T. Fadaly, Alexandre Danescu, Chenyang Mao, Marcel A. Verheijen, and Erik P. A. M. Bakkers
Phys. Rev. Materials 8, L020401 – Published 27 February 2024

Abstract

The optoelectronic properties of a semiconductor are determined by the combination of its elemental composition and the crystal structure. The vapor-liquid-solid nanowire growth mechanism offers the controlled epitaxy of the zinc-blende and wurtzite polytype for a number of semiconductors. Long, thin, and phase-pure wurtzite GaAs nanowires are desirable as epitaxial templates for the growth of hexagonal SiGe shells, but the growth of such nanowires remains a challenge. Here, we study the growth of wurtzite GaAs nanowires and find a diameter dependent critical length beyond which the crystal phase becomes mixed. The onset of uncontrolled polytypism is modeled with a small contribution of As diffusion during growth. Due to this increased supply of As during prolonged growth, Ga is depleted from the liquid catalyst, thereby decreasing the contact angle. We investigate possible pathways of As through diffusion on the facets and edges of the nanowire, and from the scaling of the critical length we deduce that edge diffusion has an important contribution. This study offers new insights for realizing long, phase-pure wurtzite GaAs nanowires with high aspect ratio.

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  • Received 7 November 2023
  • Accepted 19 January 2024

DOI:https://doi.org/10.1103/PhysRevMaterials.8.L020401

©2024 American Physical Society

Physics Subject Headings (PhySH)

  1. Physical Systems
Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Wouter H. J. Peeters1,*, Marco Vettori1,*, Elham M. T. Fadaly1,*, Alexandre Danescu2,*, Chenyang Mao1, Marcel A. Verheijen1,3, and Erik P. A. M. Bakkers1,†

  • 1Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands
  • 2University of Lyon, Lyon Institute of Nanotechnologies, UMR CNRS-5270, Ecole Centrale de Lyon, 69130 Ecully, France
  • 3Eurofins Materials Science Netherlands BV, 5656 AE Eindhoven, The Netherlands

  • *These authors contributed equally to this work.
  • e.p.a.m.bakkers@tue.nl

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Issue

Vol. 8, Iss. 2 — February 2024

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