Low mechanical loss and high refractive index in amorphous Ta2O5 films grown by magnetron sputtering

M. Molina-Ruiz, K. Shukla, A. Ananyeva, G. Vajente, M. R. Abernathy, T. H. Metcalf, X. Liu, A. Markosyan, R. Bassiri, M. M. Fejer, M. Fazio, L. Yang, C. S. Menoni, and F. Hellman
Phys. Rev. Materials 8, 035603 – Published 6 March 2024

Abstract

The ability to observe astronomical events through the detection of gravitational waves relies on the quality of multilayer coatings used on the optical mirrors of interferometers. Amorphous Ta2O5 (including TiO2:Ta2O5) currently limits detector sensitivity due to high mechanical loss. In this paper, mechanical loss measured at both cryogenic and room temperatures of amorphous Ta2O5 films grown by magnetron sputtering and annealed in air at 500 C is shown to decrease for elevated growth temperature. Films grown at 310 C and annealed yield a mechanical loss of 3.1×104 at room temperature, the lowest value reported for pure amorphous Ta2O5 grown by magnetron sputtering to date, and comparable to the lowest values obtained for films grown by ion beam sputtering. Additionally, the refractive index n increases 6% for elevated growth temperature, which could lead to improved sensitivity of gravitational-wave detectors by allowing a thickness reduction in the mirrors' coatings. Structural characterization suggests that the observed mechanical loss reduction in amorphous Ta2O5 films with increasing growth temperature correlates with a reduction in the coordination number between oxygen and tantalum atoms, consistent with TaOx polyhedra with increased corner-sharing and reduced edge- and face-sharing structures.

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  • Received 2 November 2023
  • Accepted 12 February 2024

DOI:https://doi.org/10.1103/PhysRevMaterials.8.035603

©2024 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

M. Molina-Ruiz1,*, K. Shukla2, A. Ananyeva3, G. Vajente3, M. R. Abernathy4,†, T. H. Metcalf4, X. Liu4, A. Markosyan5, R. Bassiri6, M. M. Fejer6, M. Fazio7,‡, L. Yang8, C. S. Menoni7,8, and F. Hellman1,2

  • 1Department of Physics, University of California, Berkeley, Berkeley, California 94720, USA
  • 2Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, California 94720, USA
  • 3LIGO Laboratory, California Institute of Technology, Pasadena, California 91125, USA
  • 4Naval Research Laboratory, Washington, DC 20375, USA
  • 5Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305, USA
  • 6Department of Applied Physics, Stanford University, Stanford, California 94305, USA
  • 7Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, Colorado 80523, USA
  • 8Department of Chemistry, Colorado State University, Fort Collins, Colorado 80523, USA

  • *Corresponding author: manelmolinaruiz@gmail.com
  • Present address: The Johns Hopkins University Applied Physics Laboratory, Laurel, Maryland 20723, USA.
  • Present address: University of Strathclyde, Glasgow, G1 1XQ, United Kingdom.

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Vol. 8, Iss. 3 — March 2024

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