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Characterization of MoO3 and TixMoyOz Thin Films Prepared by Atomic Layer Deposition

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Abstract

This work involves the ex situ characterization of molybdenum oxide (MoO3) and titanium molybdenum oxide (TixMoyOz) thin films grown by atomic layer deposition (ALD) at 150°C using titanium tetrachloride (TiCl4), molybdenum oxytetrachloride (MoOCl4), and water. Atomic layer deposition of TixMoyOz was carried out in supercycles consisting of TiCl4/H2O and MoOCl4/H2O subcycles. Two types of TixMoyOz films were prepared, where the ratio of subcycles was 1 : 1 (1Ti1MoO) and 1 : 7 (1Ti7MoO). The film growth rate was determined by spectroscopic ellipsometry (SE) and X-ray reflectivity (XRR). The density and root-mean-square roughness of the films were also determined from XRR. The composition of the films was determined by X-ray photoelectron spectroscopy (XPS). The degree of oxidation of molybdenum in the MoO3 and 1Ti7MoO films was +6, and in the 1Ti1MoO film, molybdenum was found in the oxidation states of +5 and +6. X-Ray diffraction analysis (XRD) showed that the films were amorphous.

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Funding

The work was supported by the Ministry of Science and Higher Education of the Russian Federation (Government Assignment No. FZNZ-2020-0002).

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Authors and Affiliations

  1. Dagestan State University, 367000, Makhachkala, Russia

    A. M. Maksumova, I. M. Abdulagatov, M. Kh. Rabadanov & A. I. Abdulagatov

  2. St. Petersburg State Institute of Technology, 190013, St. Petersburg, Russia

    I. S. Bodalev

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  1. A. M. Maksumova
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  2. I. S. Bodalev
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  3. I. M. Abdulagatov
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  4. M. Kh. Rabadanov
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Correspondence to I. M. Abdulagatov.

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Translated by O. Fedorova

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Maksumova, A.M., Bodalev, I.S., Abdulagatov, I.M. et al. Characterization of MoO3 and TixMoyOz Thin Films Prepared by Atomic Layer Deposition. Russ. J. Inorg. Chem. (2024). https://doi.org/10.1134/S003602362360274X

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