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TM- and TE-polarization-selective narrowband perfect absorber for near-ultraviolet light using Fano resonance in an aluminum nanohole array structure

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Abstract

A wavelength- and polarization-selective absorber for near-ultraviolet light with a wavelength of 375 nm was theoretically designed and experimentally verified. Furthermore, the absorption mechanism was elucidated using electromagnetic field analysis. The absorber developed in this study employs an Al nanohole array structure, which has a double-layer, two-dimensional metal nano-periodic structure. This absorber selectively absorbs near-ultraviolet light with a wavelength of 375 nm and achieves a maximum absorptance rate of over 90% for TM polarization at the angle of incidence 10.8°. This absorptance was confirmed to be due to Fano resonance originating from the coupling between localized surface plasmon generated at the nanohole edges and propagating surface plasmon resonance along the z-axis direction. Furthermore, this absorber can selectively and completely absorb not only TM- but also TE-polarized light under conditions such as varying angle of incidence and azimuth. The perfect absorptance of TE polarization was found at the angle of incidence 14.5° and that of azimuth 45° due to the combined surface plasmon resonance of the two kinds of TM polarization. This method is expected to be applied as an intermediate optical element in near-ultraviolet light, such as optical switching, and in ultraviolet optical communications.

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Data availability

The datasets generated and/or analyzed during the current study are not publicly available because of the possibility of intellectual property rights violation; however, they are available from the corresponding author upon reasonable request.

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Acknowledgements

This work was supported by Grants in Aid for Scientific Research of the Japan Society for the Promotion of Science (JSPS, KAKENHI, Grant Nos. 20K05359 and 23K04611), and Advanced Infrastructure for Materials and Nanotechnology in Japan by the Ministry of Education, Culture, Sports, Science, and Technology, Japan (Grant Nos. JPMXP1222NU0230 and JPMX1223NU0209), and Foundation of Public Interest of Tatematsu. We extend our gratitude to Prof. Takeshi Kato, Dr. Daiki Ohshima, and Dr. Katsufumi Ohsumi from Nagoya University for their assistance with the electron-beam lithography system and atomic force microscopy. We would also like to thank Prof. Yoshimasa Kawata and Prof. Wataru Inami from Shizuoka University for their cooperation with the UV laser. Additionally, we thank Enago (http://www.enago.jp) for their English language review.

Funding

This work was supported by Grants in Aid for Scientific Research of Japan Society for the Promotion of Science (JSPS, KAKENHI, Grant Nos. 20K05359 and 23K04611), the Advanced Infrastructure for Materials and Nanotechnology in Japan by the Ministry of Education, Culture, Sports, Science, and Technology, Japan (Grant Nos. JPMXP1222NU0230 and JPMX1223NU0209), and the Foundation of Public Interest of Tatematsu.

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Authors and Affiliations

  1. Graduate School of Engineering, Mie University, 1577 Kurima-Machiya-Cho, Tsu, Mie, 514-8507, Japan

    Karen Akatsuka, Kazumasa Hiramatsu & Atsushi Motogaito

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  1. Karen Akatsuka
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  2. Kazumasa Hiramatsu
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  3. Atsushi Motogaito
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Contributions

All the authors contributed to the conception and design of the study. The simulation program was developed by KH. The simulation was performed by KA and KH. Sample fabrication and optical characterization were performed by KA and AM. All the authors discussed the results of the simulation and experimental studies before and during the drafting of this manuscript. The first draft of the manuscript was written by KA, and all the authors commented on all versions of the manuscript. All authors have read and approved the final manuscript.

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Correspondence to Atsushi Motogaito.

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Akatsuka, K., Hiramatsu, K. & Motogaito, A. TM- and TE-polarization-selective narrowband perfect absorber for near-ultraviolet light using Fano resonance in an aluminum nanohole array structure. Appl. Phys. B 130, 64 (2024). https://doi.org/10.1007/s00340-024-08198-w

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