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High-Current Pulsed Planar Magnetron Discharge with Electron Injection

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Abstract

The results of experimental studies of a discharge system based on a pulsed (200–400 μs, 5–25 Hz) high-current (5–30 A) planar magnetron discharge with a target diameter of 125 mm and additional electron injection from a vacuum arc discharge are presented. The electron injection into the magnetron discharge is carried out from the back of the sputtered target through the central aperture, which provides additional acceleration of the injected electrons in a cathode layer of the magnetron discharge and an increase in the energy efficiency of the discharge system. The mass-to-charge ion composition of the generated plasma has been studied in a range of operating pressure up to an extremely low level of 0.2 mTorr. The conditions to achieve a high fraction of target material ions in the magnetron plasma are defined, including those in the range of low operating pressure range, where the typical magnetron discharge is characterized by an increase of a working gas ion fraction, and transfers into a low-current form.

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Funding

This work was supported by the Russian Science Foundation (project no. 21-19-00136).

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Authors and Affiliations

  1. Institute of High Current Electronics, Russian Academy of Sciences, 634055, Tomsk, Russia

    M. V. Shandrikov, A. A. Cherkasov & E. M. Oks

Authors
  1. M. V. Shandrikov
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  2. A. A. Cherkasov
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  3. E. M. Oks
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Corresponding author

Correspondence to M. V. Shandrikov.

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The authors of this work declare that they have no conflicts of interest.

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Translated by L. Mosina

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Shandrikov, M.V., Cherkasov, A.A. & Oks, E.M. High-Current Pulsed Planar Magnetron Discharge with Electron Injection. Plasma Phys. Rep. 50, 169–172 (2024). https://doi.org/10.1134/S1063780X23601918

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  • DOI: https://doi.org/10.1134/S1063780X23601918

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