曹鸿涛 - 中国科学院宁波材料技术与工程研究所

个人简介

学习经历： 1998年6月，东北大学毕业，获学士学位。 2001年6月，东北大学毕业，获硕士学位。 2004年6月，中国科学院金属研究所毕业，获博士学位。　工作经历： 2007年3月至今，中国科学院宁波材料技术与工程研究所先进纳米材料与器件实验室副主任，研究员。主要主持的科研项目孙喜莲，曹鸿涛等，“WO3基电致变色材料的制备及器件的研发”，浙江省科技厅攻关面上项目，课题号“2008C31G3220006”，起止时间：2008.01-2009.12 曹鸿涛，施媛媛等，“ZnO材料中与缺陷相关的紫外发光中心的研究“，宁波市自然科学基金项目，课题号” 2008A610052 “，起止时间：2008.02-2010.02 万青，曹鸿涛等，“宽禁带氧化物半导体纳米线的原位掺杂及其器件应用“，浙江省自然科学基金委重点项目，课题号”Z4080347“，起止时间: 2009.01 - 2011.12 万青，曹鸿涛等，”微纳透明晶体管和存储器”，中国科学院优秀博士学位论文、院长奖获得者科研启动专项资金　

研究领域

主要从事氧化物材料的内部微观结构与宏观性能的研究，新型氧化物材料与器件的探索、研发与应用。目前重点研究新型宽禁带氧化物半导体薄膜、氧化物高K介电薄膜、薄膜场效应晶体管；氧化物智能电致变色薄膜材料、电致变色智能窗。

近期论文

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近期发表的代表性文章 [1] L. Y Liang, Z. M. Liu, H. T. Cao(曹鸿涛), and X. Q. Pan, “Microstructural, optical and electrical properties of SnO thin films prepared on quartz via a two-step method,”ACS Applied Materials & Interfaces, DOI: 10.1021/900838z. (通讯作者) [2] L. Y. Liang, Z. M. Liu, H. T. Cao(曹鸿涛), Z. Yu, Y. Y. Shi, A. H. Chen, H. Z. Zhang, Y. Q. Fang, and X. L. Sun, 2010, “Phase and optical characterizations of annealed SnO thin films and their p-type TFT applications,” Journal of the Electrochemistry Society, 157, ?H598. (通讯作者) [3] W. Guo, L. Fu, Y. Zhang, K. Zhang, L. Y. Liang, Z. M. Liu, H. T. Cao(曹鸿涛), and X. Q. Pan, 2010, “Microstructure, optical, and electrical properties of p-type SnO thin films, ” Applied Physics Letters, 96, 042113. [4] H. Z. Zhang, H. T. Cao(曹鸿涛), A. H. Chen, L. Y. Liang, Z. M. Liu, and Q. Wan, 2010, “Enhancement of electrical performance in In2O3 thin-film transistors by improving the densification and surface morphology of channel layers,” Solid- State Electronics, 54, 479. (通讯作者) [5] A. H. Chen, H. T. Cao(曹鸿涛), H. Z. Zhang, L. Y. Liang, Z. M. Liu, Z. Yu, and Q. Wan, “Influence of the channel layer thickness on electrical properties of indium zinc oxide thin-film transistor,” Microelectronic Engineering, DOI: 10.1016/j.mee.2009.12.081, (通讯作者) [6] Y. Y. Shi, Z. Yang, H. T. Cao(曹鸿涛), and Z. M. Liu, 2010, “Controlled c-oriented ZnO nanorod arrays and m-plane ZnO thin film growth on Si substrate by a hydrothermal method,” Journal of Crystal Growth, 312, 568. (通讯作者) [7] Z. Yang, Y. Y. Shi, X. L. Sun, H. T. Cao(曹鸿涛), H. M. Lu, and X. D. Liu, 2010, “The competition growth of ZnO microrods and nanorods in chemical bath deposition process,” Materials Research Bulletin, 45, 474. (通讯作者) [8] M. Kobayashi, Y. Ishida, J. I. Hwang, G. S. Song, M. Takizawa, A. Fujimori, Y. Takeda, T. Ohkochi, T. Okane, Y. Saitoh, H. Yamagami, Amita Gupta, H. T. Cao(曹鸿涛), and K. V. Rao, 2009, “Hybridization between the conduction band and 3d orbitals in the oxide-based diluted magnetic semiconductor In2-xVxO3,” Physical Review B, 79, 205203. [9] Amita Gupta, H. T. Cao(曹鸿涛), K. Parekh and K. V. Rao, 2007, “Room temperature ferromagnetism in TM (V, Cr, Ti) doped In2O3,” Journal of Applied Physics, 101, 09513. [10] H. T. Cao(曹鸿涛), Z. L. Pei, J. Gong, C. Sun, R. F. Huang, L. S. Wen, 2004, “Preparation and characterization of Al and Mn doped ZnO (ZnO: (Al, Mn)) transparent conducting oxide films,” Journal of Solid State Chemistry, 177, 1480. [11] H. T. Cao(曹鸿涛), Z. L. Pei, J. Gong, C. Sun, R. F. Huang, L. S. Wen, 2004, “Transparent conductive Al and Mn doped ZnO thin films prepared by DC reactive magnetron sputtering,” Surface&Coatings Technology, 184, 84. [12] H. T. Cao(曹鸿涛), C. Sun, Z. L. Pei, A. Y. Wang, L. S. Wen, R. J. Hong, X. Jiang, 2004, “Properties of transparent conducting ZnO: Al (ZAO) oxide thin films and its application for molecular organic light-emitting diodes (OLEDs),” Journal of Materials Science: Materials in Electronics, 15, 165.