Abstract—

The sol-gel process for making thin-film oxide materials is a low-cost and versatile way of creating nanostructures. This method provides a uniform distribution of elements of multicomponent systems over the surface of various solids. The thickness and morphology of the surface of oxide films are largely determined by the composition, structure, and processes occurring in the sols from which the films are obtained. The selection of precursors is essential in this method to acquire the desired composite oxide materials. In this paper, we present an overview of the results of studies on the sol-gel production of thin-film oxide materials based on SiO₂–E_xO_y (E = a rare earth element (REE), Sn, Mn, Co, Ni, Ca, P), TiO₂–E_xO_y (E = Si, Sn, Co, Ni), SnO₂–E_xO_y (E = In, Sb, Ce), and ZrO₂. In the main part of the work, we consider sol-gel processes (hydrolysis, polycondensation, complex formation) involving tetraethoxysilane, tetrabutoxytitanium, antimony(III), and tin(II, IV) acetylacetonate complexes, as well as polynuclear zirconium(IV) clusters. We explore the processes of obtaining a sol, leading to its film-forming ability, the composition of micelles, the size of colloidal particles, and the change in the composition of micelles when an additive is introduced to the tetraethoxysilane-based sol. We discuss the effect of adding salts of various natures, organic ligands, and solvents on the time stability of sols. We then consider the effect of the hydrolyzing ability of doubly charged nickel, manganese, and cobalt cations on the rate of hydrolysis and polycondensation of tetraethoxysilane. Based on the studies mentioned above, we propose a general technological approach for creating sols that are resistant to film formation, using the example of tetraethoxysilane and tetrabutoxytitanium sols. We consider the relationship between the network structure of a tetraethoxysilane sol and the network structure of oxide films by the example of SiO₂–CeO₂, SiO₂–NiO, SiO₂–Mn₂O₃, and SiO₂–Co₃O₄. The effect of the rate of thermal treatment of gels on the morphology of oxide films is also studied.

中文翻译：

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用于制造多种用途的薄膜氧化物材料的溶胶-凝胶技术：简要回顾

摘要-

用于制造薄膜氧化物材料的溶胶-凝胶工艺是一种低成本且通用的创建纳米结构的方法。该方法提供了多组分系统元素在各种固体表面上的均匀分布。氧化膜表面的厚度和形态很大程度上取决于获得膜的溶胶中发生的成分、结构和过程。在该方法中，前体的选择对于获得所需的复合氧化物材料至关重要。_{在本文中，我们概述了基于 SiO 2} – Ex O _y ( E = 稀土元素 (REE)、Sn、Mn、Co 的_溶胶-凝胶法生产薄膜氧化物材料的研究结果, 镍, 钙, 磷), TiO₂ – Ex _O y ( E ₌ Si、Sn、Co、Ni)、SnO ₂ – Ex _O y ( E = In、Sb、Ce) 和_{ZrO 2}。在工作的主要部分，我们考虑涉及四乙氧基硅烷、四丁氧基钛、锑(III)和锡(II, IV)乙酰丙酮络合物以及多核锆(IV)的溶胶-凝胶过程（水解、缩聚、络合物形成）集群。我们探索了溶胶的获得过程，导致其成膜能力、胶束的组成、胶体颗粒的尺寸以及在四乙氧基硅烷基溶胶中引入添加剂时胶束组成的变化。我们讨论了添加各种性质的盐、有机配体和溶剂对溶胶时间稳定性的影响。然后我们考虑双电荷镍、锰和钴阳离子的水解能力对四乙氧基硅烷的水解和缩聚速率的影响。基于上述研究，我们以四乙氧基硅烷和四丁氧基钛溶胶为例，提出了一种创建抗成膜溶胶的通用技术方法。我们以SiO为例考虑四乙氧基硅烷溶胶的网络结构与氧化膜的网络结构之间的关系₂ -CeO ₂、SiO ₂ -NiO、SiO ₂ -Mn ₂ O ₃和SiO ₂ -Co ₃ O ₄。还研究了凝胶热处理速率对氧化膜形态的影响。