Magnetic resonance methods for express analysis and control of diamond wafers with NV⁻ centers for quantum technologies were developed. The scanning NV⁻-based ODMR spectrometer was built to analyze NV⁻ local concentration, coherent properties, stress/strain, nitrogen content, electron-nuclear interactions in diamond wafers for quantum technologies. As an example, a 3D image of the ODMR and PL maps was presented for a non-uniform distribution of NV⁻ centers in a diamond wafer, which had several growth zones with significantly different concentrations of nitrogen. The local stress/strain map was obtained by measuring the splitting of the ODMR line in zero magnetic field at room temperature. The double ODMR line is a consequence of the stress-induced splitting of the doublet with projections M_S = + 1 and M_S = − 1 in the ground triplet state of the NV⁻ center. Local concentration of nitrogen donors (in EPR literature it is designated as N or P1 centers) was estimated from the ratio of the intensity of satellites caused by interaction with nitrogen donors and the central line of ODMR. The central line has a 2E split into two overlapping lines, the intensity of one of the lines is selected. The spectrometer is also designed to perform pulsed measurements of Rabi oscillations, spin–lattice and spin–spin relaxation times at wafer points isolated by focused laser excitation. A new option for using a spectrometer was introduced for measuring the ODMR of NV⁻ centers in a linearly polarized light, which allowed to distinguish PL for centers of a certain orientation and suppress the PL from others.

开发了用于快速分析和控制具有用于量子技术的 NV ⁻ 中心的金刚石晶片的磁共振方法。基于扫描 NV ⁻ 的 ODMR 光谱仪用于分析量子技术中金刚石晶片中的 NV ⁻ 局部浓度、相干特性、应力/应变、氮含量、电子-核相互作用。例如，显示了金刚石晶片中 NV ⁻ 中心不均匀分布的 ODMR 和 PL 图的 3D 图像，该晶片具有多个氮浓度显着不同的生长区域。通过测量室温下零磁场中 ODMR 线的分裂获得局部应力/应变图。双 ODMR 线是应力诱导双峰分裂的结果，在 NV < 的基三重态中投影 M _S = + 1 和 M _S = − 1 b6>中心。氮供体的局部浓度（在 EPR 文献中被指定为 N 或 P1 中心）是根据与氮供体相互作用引起的卫星强度与 ODMR 中心线的比率来估计的。中心线有一个 2E 分成两条重叠的线，选择其中一条线的强度。该光谱仪还设计用于在通过聚焦激光激发隔离的晶片点处对拉比振荡、自旋晶格和自旋-自旋弛豫时间进行脉冲测量。引入了使用光谱仪的新选项，用于测量线性偏振光中 NV ⁻ 中心的 ODMR，从而可以区分特定方向中心的 PL 并抑制其他中心的 PL。