Abstract

This work involves the ex situ characterization of molybdenum oxide (MoO₃) and titanium molybdenum oxide (Ti_xMo_yO_z) thin films grown by atomic layer deposition (ALD) at 150°C using titanium tetrachloride (TiCl₄), molybdenum oxytetrachloride (MoOCl₄), and water. Atomic layer deposition of Ti_xMo_yO_z was carried out in supercycles consisting of TiCl₄/H₂O and MoOCl₄/H₂O subcycles. Two types of Ti_xMo_yO_z films were prepared, where the ratio of subcycles was 1 : 1 (1Ti1MoO) and 1 : 7 (1Ti7MoO). The film growth rate was determined by spectroscopic ellipsometry (SE) and X-ray reflectivity (XRR). The density and root-mean-square roughness of the films were also determined from XRR. The composition of the films was determined by X-ray photoelectron spectroscopy (XPS). The degree of oxidation of molybdenum in the MoO₃ and 1Ti7MoO films was +6, and in the 1Ti1MoO film, molybdenum was found in the oxidation states of +5 and +6. X-Ray diffraction analysis (XRD) showed that the films were amorphous.

中文翻译：

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原子层沉积制备的 MoO3 和 TixMoyOz 薄膜的表征

摘要

_{这项工作涉及使用四氯化钛 (TiCl 4} )、四氯化钼通过原子层沉积 (ALD) 在 150°C 下生长的氧化钼 (MoO 3 ) 和钛钼氧化物 (Ti x _{Mo y} O _z )_薄膜的异位表征(MoOCl ₄ )和水。_{Ti x} Mo _y O _z的原子层沉积在由TiCl ₄ /H ₂ O和MoOCl ₄ /H ₂ O子循环组成的超级循环中进行。制备了两种类型的 Ti _x Mo _y O _z薄膜，其中子循环比例为 1:1 (1Ti1MoO) 和 1:7 (1Ti7MoO)。薄膜生长速率由光谱椭圆光度法（SE）和X射线反射率（XRR）测定。薄膜的密度和均方根粗糙度也由 XRR 测定。通过X射线光电子能谱(XPS)测定薄膜的组成。_{MoO 3}和1Ti7MoO膜中钼的氧化态为+6，而在1Ti1MoO膜中，钼的氧化态为+5和+6。X射线衍射分析（XRD）表明薄膜是非晶态的。