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Effect of MoN on the structure and characteristics of MoN/ZrMoN bi-layer nitride films
Bulletin of Materials Science ( IF 1.8 ) Pub Date : 2024-03-23 , DOI: 10.1007/s12034-023-03136-6
Ding-Chiang Hu , Dong-Hau Kuo , Chung-Chen Tsao , Jihng-Kuo Ho , Chin-Guo Kuo , Chun-Yao Hsu

Multi-alloy-modified film is used to protect the surface of tools and components. MoN/ZrMoN bi-layer films are deposited by sputtering. The effect of the MoN deposition time and the DC power for the Zr target on the structure and mechanical performance of the coated films is studied. The ZrMoN films correspond to the (111), (200) and (220) crystal planes of the FCC (NaCl) structures. The diffraction peaks for the (111) plane gradually shift to lower 2θ values as the Zr content is increased. For a MoN buffer layer with a thickness of ~393 nm, the ZrMoN film has a hardness of 12.53 GPa and a coefficient of friction of 0.42. As the DC power for the Zr target is increased to 200 W, the e hardness and elastic recovery for the MoN/ZrMoN bi-layer films are 15.65 GPa and 67.70%, respectively, which are the maximum respective values. The experimental results show that these bi-layer films have good mechanical performance and adhesive strength.



中文翻译:

MoN对MoN/ZrMoN双层氮化物薄膜结构和特性的影响

多合金改性薄膜用于保护工具和部件的表面。 MoN/ZrMoN 双层薄膜通过溅射沉积。研究了MoN沉积时间和Zr靶的直流功率对镀膜结构和力学性能的影响。 ZrMoN 薄膜对应于 FCC (NaCl) 结构的 (111)、(200) 和 (220) 晶面。随着Zr含量的增加,(111)面的衍射峰逐渐向较低的2θ值移动对于厚度约为393 nm的MoN缓冲层,ZrMoN薄膜的硬度为12.53 GPa,摩擦系数为0.42。当Zr靶材的直流功率增加到200 W时,MoN/ZrMoN双层薄膜的e硬度和弹性回复率分别为15.65 GPa和67.70%,均为各自的最大值。实验结果表明,这些双层薄膜具有良好的机械性能和粘合强度。

更新日期:2024-03-24
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